That's one thing that concerns me about cusp machines, their are lines heading from the central reaction region directly into material surfaces, this means unless you are very careful, the ions incident on materials will be of energies 100's of Kev rather than 100's of eV
The stalk losses, will still be at full core fusion energy won't they? This would present a sputtering problem, it is concieveable you could do clever things to reduce them but it won't be easy, because electrons are coming out of the stalks aswell, change the stakls positive to repel the ions: you attract more electrons, charge them negative to rel the electrons and you attract more ions.
But the potential along any fieldline is roughly constant due to the fact that electrons are highly mobile, therefore the cusps will not just be cusps of magnetic field, they will also be cusps of low potential, this should allow some ions to penetrate to them. I think this is what Dr. Bussard was refering to when he spoke of the 'ion holes' in WB5
"These losses were extensive, and attempts to reduce
them by use of floating ceramic repellers placed along about
1/2 of the seam lines reduced e-losses by 2.5x but only at the
price of opening up huge loss areas for trapped ions."
I think the actual phrase 'ion holes' might be in the video, but I can’t get the pdf.
Here is a reference for a fusion technology paper which says that field lines have a strong tendency to be regions of equipotential:
Ion defocusing in multicusp plasma confinement systems
Author Dolan T J
Fusion Technology, vol.24 no.1 August 1993 p.127. Journal Article
I think Dr. B. makes the point that the high losses were specific to a closed box machine. My description was related to an open box (electron recirculation) machine.
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